| 摘要 |
PURPOSE:To enable manufacturing of a phosphor screen with high quality by providing each process of the photoresist coating formation, exposure, development, nontransparent optical absorption material coating formation, swelling, and high pressure event. CONSTITUTION:Photoresist liquid is contained in the inner surface of a panel. A photoresist coating is formed by subsequently shaking off the liquid by rotation and drying it. Then, a shadow mask is mounted and a photoresist coating at a position where phosphor dots made of the three primary colors are formed is cured optically. Further, the photoresist coating is sprayed by hot pure water and the dots made of an optically cured photoresist layer is formed on the inner surface of the panel. Furthermore, a carbon coating is formed by coating the inner surface of the panel with the colloid-type black carbon suspension and drying the liquid. After that, peeling liquid is injected in the inner surface of the panel and is uniformly permeated into the optically cured photoresist layer and the high pressure development is performed by spraying hot pure water by high pressure. Subsequently, drying is performed and the phosphor dots made of the three primary colors are formed and then a deposition coating made of aluminum is formed. As a result, a phosphor screen that is rich in the uniformities with good quality can be manufactured. |
