| 摘要 |
<p>A composition for an anti-reflective film is provided to absorb well far UV rays passing through a photoresist film, thereby reducing sine waves, and to form a pattern having an excellent pattern shape. A composition for an anti-reflective film comprises a polymer having repeating units selected from the group consisting of the following formulae 1-6 and a combination thereof. In formula 1, R1 is anthracene methyl; R2 and R3 are the same or different and each represents H, methyl or ethyl; R4, R5 and R6 are the same or different. and represent H or methyl; the weight ratio of l:m;n is 0.1-8:0.1-3:1 when n is not 0, or the weight ratio of l:m is 1-10:1 when n is 0. In formula 2, R7 is anthracene methyl; R8, R9 and R10 are the same or different, and represent methyl or ethyl; and the weight ratio of a:b:c is 0.1-8:1:0.1-5. In formula 3, R11 is anthracene methyl; R12 and R13 are the same or different, and represent H, methyl or ethyl; and the weight ratio of d:e is 1:0.1-5. In formula 4, R14 is H, methyl, ethyl or t-butyl; R15 is H, methyl or t-butyl; R16 is H, methyl or ethyl, and the weight ratio of f:g:h is 1-10:1_1-10 when g is not 0, or the weight ratio of f:h is 1:0.1-10 when g is 0. In formula 5, R17 is anthracene methyl; R18 is a fluorine-containing C1-C20 alkyl; R19, R20 and R21 are the same or different, and represent H, methyl or ethyl; x is an integer of 1-5; and the weight ratio of I:j:k is1:0.01-1:0.1-10. In formula 6, R22 is a fluorine-containing C1-C20 alkyl; r23 and R24 are the same or different, and represent H, methyl or ethyl; and the weight ratio of o:p is 1:0.1-10.</p> |
