APPARATUS AND METHOD OF REFERENTIAL POSITION MEASUREMENT AND PATTERN-FORMING APPARATUS

摘要

An apparatus and a method for measuring a reference position and a pattern-forming apparatus are provided to obtain a high throughput by adjusting a vertical position or height without interruption. A photographing device(25) is arranged at an upper part of a stage in order to photograph an image of a reference mark in a perpendicular direction with respect to an upper surface of a substrate(11). A storage device stores a distortion correction data set(59) corresponding to a different variation level of the upper surface of the substrate from a focusing surface of the photographing device. A measurement device measures a variation of the upper surface of the substrate. A decision device decides the optimum distortion correction data set on the basis of the measured variation and the stored distortion correction data. A correction device corrects the distortion of the image of the reference mark by using the decided distortion correction data. A definition device defines the position of the reference mark on the basis of the image of the reference mark.