| 摘要 |
PURPOSE:A photosensitive, heat-resistant material excellent in storage stability and patterning property and capable of forming an insulating film of excellent heat resistance by a simple process, comprising a reaction product between a specified polyquinazolone polymer and an isocyanate compound. CONSTITUTION:A polyquinazolone polymer is formed by reacting a diamine of formula I (wherein R1 is a trivalent or tetravalent group comprising an aromatic ring, n is 1 or 2, and the carboxyl group is ortho to the amino group), e.g., 2,5-diaminobenzoic acid, and a diamine of formula II (wherein R2 is a 2C or higher bivalent group), e.g., 4,4'-diaminodiphenyl ether, with a bisoxazinone of formula III [wherein R3 is formula IV, V, or VI (wherein X is O, S or the like), and R4 is H, or a monovalent organic group], e.g., benzo-di(methyloxazinone). Said polymer is reacted with an isocyanate compound of formula VII (wherein R5 is a photopolymerizable group), e.g., cinnamoyl isocyanate, to obtain a photosensitive, heat-resistant material.
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