| 摘要 |
PURPOSE:To correct white spot defects of an X-ray mask and to repair a conductive pattern on an LSI substrate, by employing vapor of gold, molybdenum, palladium, tantalum or tungsten compound. CONSTITUTION:Compound vapor 7 sprayed on the substrate 1 to be deposited, evaporates after it has stayed there for any time determined by the substrate temperature and the kind of the compound. At this time, a deposited compound layer 9 is produced at the place where the compound has been sprayed. Irradiating laser or particle beam 5 onto the deposited compound layer 9 results in decomposition or combination of the compound to form a pattern film 10 which is deposited increasingly as time proceeds. By employing molybdenum, palladium or tungsten compound as the said compound, an X-ray mask which has sufficient X-ray blocking ability by a film thickness of about 1mum can be provided. |
