APPARATUS FOR CONTINUOUSLY DEPOSITING A LAYER OF A SOLID MATERIAL ON THE SURFACE OF A SUBSTRATE BROUGHT TO A HIGH TEMPERATURE

摘要

The apparatus comprises a nozzle head having three converging nozzles which project the reagents (SnCl4 and H2O) in the gaseous phase onto the substrate to be plated. Deflector members, which are adapted to channel the gases between them and the substrate, extend on either side of the nozzle head. The surface of the deflector member which extends in the opposite direction to the direction of movement of the substrate with respect to the nozzle is parallel to the substrate, and the edge which it forms at an acute angle with the extended external wall of the third nozzle is transversely offset in the direction of the said movement with respect to the axial median plane of the nozzle. The surface of the second deflector member forms a rounded edge with the corresponding longitudinal wall of the second nozzle. The opening of the nozzle head between the edges is therefore effectively inclined and the gases emerging therefrom are deflected in the direction of movement of the substrate.