| 摘要 |
PURPOSE:To manufacture the thin film of a shape memory alloy which is difficult to work by forming the thin film of the shape memory alloy on the surface of a substrate with a sputtering method. CONSTITUTION:A shape memory alloy as an Ni-Ti or a Cu-base alloy is poorly workable, and hardly shaped into a thin plate. A substrate made of metals, nonmetals, or organic materials is preheated to >=200 deg.C, and said shape memory alloy is vapor-deposited on the surface by physical or chemical vapor deposition in the form of a thin film consisting of a minute structure and having <=50mum thickness and the grain diameter <=1/3 times the film thickness. In this case, by selecting the conditions that the alloy is quenched and solidified on the substrate, the high-temp. phase is supercooled to room temp. in a noneqilibrium state, and an excellent shape memory alloy in the form of a thin film can be manufactured without requiring heat treatment. |
