| 摘要 |
PURPOSE:To obtain a radiation inductive resin compsn. having high inductivity for high energy rays and improved resolution, precise processability and resistance to dry etching by incorporating an alkali-soluble polymer and an amine compd. as essential components. CONSTITUTION:The alkali-soluble polymer, e.g. novolak resin, etc. has superior resistance to dry etching, and a mixture thereof with an amine compd. has improved solubility in an alkaline developing soln. when it is unexposed to radiation. On the other hand, the exposed part to radiation becomes alkali-insoluble being useful as a negative resist material having superior resistance to dry etching. Such resin compsn. has high inductivity to high energy radiation such as electron rays, X-rays, ion beam, as well as high resolution, precise processability, and resistance to dry etching. The compsn. is useful as a material for forming pattern of an electronic parts, etc. |
