发明名称 |
METHOD OF GENERATING NEGATIVE RESIST IMAGE |
摘要 |
A negative tone resist image is achieved by (1) coating a substrate with a film of a polymer containing a masked, reactive functionality; (2) imagewise exposing the film to radiation in a fashion such that the masked functionality is liberated; (3) contacting the film with an organometallic reagent; (4) developing the relief image by the oxygen plasma etching. |
申请公布号 |
JPS60241225(A) |
申请公布日期 |
1985.11.30 |
申请号 |
JP19850022142 |
申请日期 |
1985.02.08 |
申请人 |
INTERN BUSINESS MACHINES CORP |
发明人 |
HIROSHI ITOU;SUKOTSUTO AASAA MAKUDONARUDO;ROBAATO DENISU MIRAA;KAARUTON GURANTO UIRUSON |
分类号 |
G03F7/30;G03F7/038;G03F7/039;G03F7/26;G03F7/36;G03F7/38;H01L21/027 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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