发明名称 半導体装置の作製方法
摘要 It is an object to provide a semiconductor having a novel structure. In the semiconductor device, a plurality of memory elements are connected in series and each of the plurality of memory elements includes first to third transistors thus forming a memory circuit. A source or a drain of a first transistor which includes an oxide semiconductor layer is in electrical contact with a gate of one of a second and a third transistor. The extremely low off current of a first transistor containing the oxide semiconductor layer allows storing, for long periods of time, electrical charges in the gate electrode of one of the second and the third transistor, whereby a substantially permanent memory effect can be obtained. The second and the third transistors which do not contain an oxide semiconductor layer allow high-speed operations when using the memory circuit.
申请公布号 JP5923206(B2) 申请公布日期 2016.05.24
申请号 JP20150145730 申请日期 2015.07.23
申请人 株式会社半導体エネルギー研究所 发明人 山崎 舜平;小山 潤;加藤 清
分类号 H01L21/8242;H01L21/336;H01L27/10;H01L27/108;H01L29/786 主分类号 H01L21/8242
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