发明名称 GENOM BESTRAOLNING POLYMERISERBAR KOMPOSITION OCH UR DENNA FRAMSTAELLD FOTOPOLYMERISERBART KOPIERINGSMATERIAL
摘要 A radiation-polymerizable mixture comprising a compound having at least two terminal ethylenically unsaturated groups which can form a crosslinked polymer by means of free-radical initiated addition polymerization, a polymeric binder, a radiation activatable polymerization initiator, and a compound having two epoxy groups in the molecule and a molecular weight of not more than 1,500; and a photopolymerizable copying material having a flexible transparent temporary support and a transferrable thermoplastic photopolymerizable layer comprising the above-described radiation-polymerizable mixture.
申请公布号 FI69714(B) 申请公布日期 1985.11.29
申请号 FI19820001260 申请日期 1982.04.08
申请人 HOECHST AG 发明人 HERWIG WALTER;DECKER RUDOLF;SIKORA HELGA;ERBES KURT
分类号 B23K35/22;C08F299/02;C08G59/00;C08G59/40;G03F7/004;G03F7/032;H05K3/28 主分类号 B23K35/22
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