PRODUCTION OF OPTICAL MEMORY ELEMENT

摘要

PURPOSE:To form a guide address part and guide track part at different depths by coating resist on a glass substrate, exposing once the groove part of the guide track and exposing twice the track address part then subjecting the resist to reactive etching after development. CONSTITUTION:The positive type resist is coated on the glass substrate 1' and a mask 6 (consisting of a substrate 6 and a Cr part 7) is brought into tight contact with a resist film 5. UV rays 9 are irradiated thereon. The Cr part 7 is an address signal and the part 8 absent of Cr is the guide track. The UV rays are irradiated only on the guide address part by using the other mask 6'. The resist film is developed to form the address signal 2 and the guide track 3. The time is controlled in this state in such a way that the resist 10 of a prescribed thickness remains in the part 3 and that the glass substrate 1' is exposed in the signal part 2. The resist film is then subjected to reactive etching to form the address signal part 2 having lambda/4n depth and the guide track part 3 having lambda/8n depth. The resist film 11 is then removed.