| 摘要 |
<p>PURPOSE:To correct the defects of a photomask in an extremely short time, by placing metallic foil on the surfaces of defects occurring on the predetermined pattern consisting of a light shielding material layer and irradiating the foil with high energy beams to locally fuse this. CONSTITUTION:When lack type defects 5 are present on metal thin film 2 (circuit pattern) formed on substrate 1 of a photomask, reticle, or the like, these parts are covered with metallic foil, e.g. gold foil 3, and defects 5 are irradiated by high energy beam 4, such as laser beam. Foil 3 is locally fused and attached to the glass underlayer, unnecessary foil (not fused foil) is stripped, and fused metal 6 added to defects 5 is left, thus completing correction operation.</p> |
