| 摘要 |
PURPOSE:To enable to curtail exposure processing time by a method wherein shield regions of size the same or more with width of mark regions are provided between the pattern region of a mask for exposure and the mark regions on both the sides of the pattern region. CONSTITUTION:A pattern region Pa drawn with the desired circuit pattern is formed to a reticle R. Marks M1, M2 are formed respectively at the positions separated by the equal distance to right and left in the (x) direction from the center RC of the region Pa. The marks M1, M2 are formed respectively inside of mark regions Pm1, Pm2. Non-exposing regions Pc1, Pc2 having width in the (x) direction the same or more with width in the (x) direction of the regions Pm1, Pm2 are formed between the respective regions Pm1, Pm2 and the region Pa. Accordingly, when a chip and the original picture pattern of a mask to be superposed are to be positioned, openings for positioning provided to the mask are separated from the original picture pattern, and shielding of the original picture pattern according to an optical system is not generated. Accordingly, the process can be shifted to exposing motion at once. |
