发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method which can increase intervals among a plurality of semiconductor chips without deteriorating handleability of a semiconductor chip.SOLUTION: A semiconductor device manufacturing method comprises: a process of singulating a wafer attached to a first adhesive sheet 10 by dicing to form a plurality of semiconductor chips CP; a process of stretching the first adhesive sheet 10 to increase intervals among a plurality of semiconductor chips CP; a process of transferring the plurality of semiconductor chips CP to a second adhesive sheet 20; a process of removing the first adhesive sheet 10; and a process of stretching the second adhesive sheet 20 to further increase intervals among the plurality of semiconductor chips CP.SELECTED DRAWING: Figure 2
申请公布号 JP2016127115(A) 申请公布日期 2016.07.11
申请号 JP20140266139 申请日期 2014.12.26
申请人 LINTEC CORP 发明人 OKAMOTO NAOYA;SATO AKINORI;FUJIMOTO YASUSHI;MENJU TOSHIAKI;YAMADA TADATOMO;KAWASAKI YOSHIHIKO
分类号 H01L21/301;H01L21/56;H01L21/683;H01L23/12 主分类号 H01L21/301
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