发明名称 Method of making semiconductor memory device
摘要 Herein disclosed is a semiconductor memory device which is composed of a peripheral circuit unit equipped with a gate protection circuit having a protection resistor and a memory cell unit so that it can be used as an MISFET type static RAM and which is characterized in that the protection resistor is made of a polycrystalline silicon film having substantially the same resistivity as that of an overlying polycrystalline silicon film formed to merge into the load resistor of the memory cell unit.
申请公布号 US4554729(A) 申请公布日期 1985.11.26
申请号 US19820341623 申请日期 1982.01.22
申请人 HITACHI, LTD. 发明人 TANIMURA, NOBUYOSHI;YASUI, TOKUMASA
分类号 G11C11/417;G11C11/412;H01L21/02;H01L21/3215;H01L21/822;H01L21/8234;H01L21/8238;H01L21/8244;H01L27/02;H01L27/04;H01L27/06;H01L27/092;H01L27/11;H01L29/78;(IPC1-7):H01L21/28;H01L21/26 主分类号 G11C11/417
代理机构 代理人
主权项
地址