| 发明名称 | TiAgN coating layer, TiAgN coating method and TiAgN coating apparatus | ||
| 摘要 | Disclosed is a TiAgN coating layer, formed by subjecting a substrate having a surface roughness of about 0.05˜0.1 μm to plasma coating by periodically turning on/off an Ag source while a Ti source is continuously turned on in a nitrogen gas atmosphere, a TiAgN coating method, and a TiAgN coating apparatus. | ||
| 申请公布号 | US9399813(B2) | 申请公布日期 | 2016.07.26 |
| 申请号 | US201313830250 | 申请日期 | 2013.03.14 |
| 申请人 | Hyundai Motor Company | 发明人 | Hong Woong Pyo;Lyo In Woong;Kang Hyuk;Choi Kwang Hoon |
| 分类号 | C01B21/00;C23C14/06;C01B21/076;C01B21/06;H01J37/32 | 主分类号 | C01B21/00 |
| 代理机构 | Mintz Levin Cohn Ferris Glovsky and Popeo, P.C. | 代理人 | Mintz Levin Cohn Ferris Glovsky and Popeo, P.C. ;Corless Peter F. |
| 主权项 | 1. A TiAgN coating method using a plasma coating process, comprising: processing a surface of a substrate to form a surface roughness of 0.05˜0.1 μm; and introducing a nitrogen gas into a chamber in which the substrate is disposed, turning on a Ti source, and periodically turning an Ag source on and off, thus forming a TiAgN coating layer on the surface of the substrate, wherein the forming the TiAgN coating layer comprises rotating a jig which holds the substrate at about 20˜50 rpm. | ||
| 地址 | Seoul KR | ||