发明名称 ELECTRON BEAM DIFFRACTION AND MEASURING APPARATUS
摘要 PURPOSE:To obtain a stationary diffraction image of a specimen in a rotating state, by generating the synchronous signal corresponding to the rotation of the specimen by a synchronous signal generation circuit and modulating electron beam in synchronous relation to the rotation of the specimen by said synchronous signal while performing the erasion control of the light image on a memory type light emitting surface. CONSTITUTION:When a block 3 and a specimen 2 are rotated by a rotary mechanism 4, a synchronous pulse is generated from a synchronous signal generation circuit 8 and applied to a modulation circuit 9 and a light emitting surface control circuit 10. A short-time pulse modulation signal is applied to an electron beam generation apparatus 5 from the modulation circuit 9 and electron beam synchronous to the rotation of the specimen 2 is allowed to irradiate the specimen 2. The electron beam diffracted by the thin film on the surface of the specimen forms a light emitting diffraction image on the light emitting surface 7 and preserves the same. The light emitting surface control circuit 10 erases the diffraction image on the light emitting surface 7 before the specimen 2 is irradiated with the next pulse like electron beam. By this method, a stationary diffraction image is obtained without imparting an obstruction to the growth of a crystal while the rotation of the specimen 2 is succeeded.
申请公布号 JPS60237348(A) 申请公布日期 1985.11.26
申请号 JP19840094966 申请日期 1984.05.10
申请人 MITSUBISHI DENKI KK 发明人 SUGIMOTO HIROSHI
分类号 G01N23/20;H01J37/295;H01L21/203 主分类号 G01N23/20
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