发明名称 DIFFUSION-SUPPLY-TYPE ION SOURCE
摘要 PURPOSE:To enable the amount of an ionization metal contained in a porous heater to be controlled and reduce the amount of the ionization metal evaporated around an ion source by preparing it from an ion emitter and the porous heater. CONSTITUTION:An ionization metal is contained in a hair-pin-like or coil-like porous heater 2' to which an ion emitter 1 with a pointed end is attached. Owing to the above structure, the amount of the ionization metal contained in the porous heater 2' can be varied by controlling the porosity of the heater 2'. Furthermore, because the ionization metal is not exposed, the amount of the ionization metal evaporated around the ion source can be reduced.
申请公布号 JPS60236431(A) 申请公布日期 1985.11.25
申请号 JP19850098068 申请日期 1985.05.10
申请人 HITACHI SEISAKUSHO KK 发明人 HONDA YUKIO;TAGUCHI TADANORI;AIDA TOSHIYUKI
分类号 H01J37/08;H01J1/02;H01J27/26 主分类号 H01J37/08
代理机构 代理人
主权项
地址