发明名称 |
Semiconductor die with high pressure cavity |
摘要 |
A semiconductor die includes a device structure having a micro-electronic device located at a surface of a substrate and a cap coupled to the device structure with the micro-electronic device positioned in a cavity located between the cap and the substrate. A sacrificial material is provided within the cavity, coupling the cap to the device structure. The sacrificial material is heated in the cavity to cause the sacrificial material to decompose to a gaseous species. The presence of the gaseous species in the cavity increases a pressure level in the cavity from an initial pressure to a final pressure. |
申请公布号 |
US9416003(B2) |
申请公布日期 |
2016.08.16 |
申请号 |
US201414188649 |
申请日期 |
2014.02.24 |
申请人 |
FREESCALE SEMICONDUCTOR, INC. |
发明人 |
Lagouge Matthieu |
分类号 |
B81B7/02;B81C1/00;H01L21/447 |
主分类号 |
B81B7/02 |
代理机构 |
|
代理人 |
Bergere Charles E. |
主权项 |
1. A method of fabricating a semiconductor die that includes a device structure and a cap defining a hermetically sealed cavity, the device structure having a micro-electronic device located at a surface of a substrate, the method comprising:
providing a sacrificial material within the cavity, wherein the sacrificial material comprises a thermoplastic polymer; coupling the cap to the device structure with the micro-electronic device positioned in the cavity; and heating the sacrificial material in the cavity to cause the sacrificial material to decompose to a gaseous species to increase a pressure in the cavity from a first pressure level to a second pressure level, wherein heating the sacrificial material is performed at a temperature sufficient to entirely decompose the sacrificial material to the gaseous species. |
地址 |
Austin TX US |