发明名称 Semiconductor die with high pressure cavity
摘要 A semiconductor die includes a device structure having a micro-electronic device located at a surface of a substrate and a cap coupled to the device structure with the micro-electronic device positioned in a cavity located between the cap and the substrate. A sacrificial material is provided within the cavity, coupling the cap to the device structure. The sacrificial material is heated in the cavity to cause the sacrificial material to decompose to a gaseous species. The presence of the gaseous species in the cavity increases a pressure level in the cavity from an initial pressure to a final pressure.
申请公布号 US9416003(B2) 申请公布日期 2016.08.16
申请号 US201414188649 申请日期 2014.02.24
申请人 FREESCALE SEMICONDUCTOR, INC. 发明人 Lagouge Matthieu
分类号 B81B7/02;B81C1/00;H01L21/447 主分类号 B81B7/02
代理机构 代理人 Bergere Charles E.
主权项 1. A method of fabricating a semiconductor die that includes a device structure and a cap defining a hermetically sealed cavity, the device structure having a micro-electronic device located at a surface of a substrate, the method comprising: providing a sacrificial material within the cavity, wherein the sacrificial material comprises a thermoplastic polymer; coupling the cap to the device structure with the micro-electronic device positioned in the cavity; and heating the sacrificial material in the cavity to cause the sacrificial material to decompose to a gaseous species to increase a pressure in the cavity from a first pressure level to a second pressure level, wherein heating the sacrificial material is performed at a temperature sufficient to entirely decompose the sacrificial material to the gaseous species.
地址 Austin TX US