发明名称 ELECTRON BEAM GENERATION DEVICE
摘要 PURPOSE:To always obtain a stable linear beam by providing expansion bellows at the mounting mount section of a filament and adjusting the relative positional relationship of a linear filament and a grid while they are being irradiated with an electron beam. CONSTITUTION:A flange 21 is provided on the upper end of an insulator 6 and bellows 22 are mounted at the lower part in the airtight holding welding structure. The lower end of the bellows 22 is also mounted airtightly on a separate flange 23. Then, by adjusting a height adjusting screw mechanism 24, the position of a filament 3 can be adjusted tridimensionally for the slit position of a grid 2'. As a result, since the profile can be monitored and corrected realtime while it is being irradiated with an electron beam, the uniformity of the current density distribution of a linear electron beam and such can always be held.
申请公布号 JPS60235336(A) 申请公布日期 1985.11.22
申请号 JP19840090395 申请日期 1984.05.07
申请人 NIPPON DENKI KK 发明人 KAWASE YUTAKA;SAITOU SHIYUUICHI
分类号 H01J37/06;H01J37/067;H01J37/30 主分类号 H01J37/06
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