| 摘要 |
<p>Process for fabricating wraparound solar cells wherein vertical slots are scribed in a semiconductor wafer to initially define the lateral dimensions of the cell. Thereafter, photolithographic masking, etching and diffusion steps are used to define the geometry of a p-n junction of the cell. Then, using lift-off photolithography and a multiple-element metal deposition process, the solar cell grid lines are formed on one surface of the cell and p- and n-type metal contacts are extended around to the opposite surface of the cell. In this manner, the dimensions of the cell can be made less than the diameter of the semiconductor wafer from which it is made.</p> |
