| 摘要 |
PURPOSE:To improve the patterning accuracy in the photoetching method with a smaller convex step of a heat generating body while enhancing the allowance for print positioning adjustment with a larger radius of curvature of the convex profile by forming a glaze layer of a heat generating body with the thickness at least equivalent to the depth of a groove on an insulation substrate. CONSTITUTION:An alumina substrate 1 with the thickness of 1.5mm. having a groove 0.6mm. wide and 50mum deep is used to form a partial glaze layer 2 made of a high-melting-point glass in the groove. The step shall measure 10+ or -5mum from the aluminum substrate 1 in the perimeter of the glaze layer 2 and the mean of the effective thickness of the glaze layer 2 be 60mum. Then, a resistor 3 is formed as film with the thickness of 0.3mum by sputtering Ta-Si and an electrode body 4 as film at the thickness of 2mum by vacuum evaporation of Al, both subjected to a pattern formation by photoetching. Subsequently, a protective layer 5 is formed as film at the thickness of 7mum by sputtering Ta2O5 to form a heat generating body. This reduces the convex step to + or -10<5>mum. |
