发明名称 ETCHING METHOD
摘要 PURPOSE:To prevent the over-etching of a foundation layer by dividing the larger window part into sections having the length equal to the width of the smaller window part and therefore eliminating the ecthing speed difference between both window parts. CONSTITUTION:A connecting window part 7 having a larger size is divided into plural window parts 7a having the same width as that of a connection window 6 of the smallest size. Thus the etching speed difference is eliminated between both parts 6 and 7. An equal etching speed secured between both parts 6 and 7 prevents a case wiring patterns (4a, 4b) serving as the foundation layers opposite to the parts 6 and 7 are over-etched and therefore these patterns are thinned or have the film break. In this way, a thin film magnetic head having a high grade of quality is obtained.
申请公布号 JPS60234212(A) 申请公布日期 1985.11.20
申请号 JP19840089367 申请日期 1984.05.07
申请人 SONY KK 发明人 WADA YOSHITAKA;OONUMA KAZUNORI;HAYASHI KATSUTOSHI
分类号 G11B5/31;H01L21/302;H01L21/306;H01L21/3065;H01L21/3205;H01L21/3213;H01L21/768 主分类号 G11B5/31
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