| 摘要 |
PURPOSE:To prevent the liquid dispersing out of an object to be dried from attaching again to this object, by a method wherein an aperture provided in a containing jig is opened in a direction of action of the force at the time of rotation rise before drying an object to be dried by holding it in the containing jig and under rotation. CONSTITUTION:An object to be dried 13 of plate form such as a semiconductor wafer or a mask is sandwiched by opposed cartridges 14 provided in a cartridge holder 16. The holder 16 is contained in a containing chamber 15, and a plurality of the containing chambers 15 are accommodated in a rotor 11. In this construction, the rear end of the containing chamber 15 is blocked with a chamber diaphragm 17, and a hole provided in the side wall in its neighborhood is connected to a nozzle 12 at the center of the rotor 11. The surfaces opposed to the diaphragms 17 of a plurality of containing chambers 15 thus constructed are provided with apertures to exhaust water driplets, respectively, in such a manner that centrifugal force exerts. Such a manner does not allow the droplets dispersing out of the object 13 to be dried to attach again to this object 13 in drying by blowing N2 gas into the chambers 15 through the nozzle 12 via hole under the rotation of the rotor 11, and all of the droplets are dispersed outside through the apertures. |
