| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method that enables a simple manufacturing of an organic transistor element, which can form an insulation film formed from a photosensitive resin on a fluororesin film having high liquid repellency by wet coating, and which achieves high adhesion between an insulation film formed from the photosensitive resin film through a photolithography process and an insulation film formed from the fluororesin, and which has the insulation film subjected to microfabrication.SOLUTION: A manufacturing method of obtaining an organic transistor element 10 includes the steps of: coating a photosensitive resin component on a laminate, which has a substrate 1, a gate electrode 2, a gate insulation film 3, a source electrode 4, a drain electrode 5, an organic semiconductor layer 6 and a first insulation film 7 which contains a fluororesin (F) and has 105° and over for a water contact angle of surface, to form a photosensitive resin film; and partially exposing and developing the photosensitive resin film to form a second insulation film 8. The photosensitive resin component contains a fluororesin (A) having a crosslinkable group and radical polymerization initiator (C), and a fluorine atom content in a solid content is 10 to 45 mass%.SELECTED DRAWING: Figure 1 |
