发明名称 PARTICLE BEAM SOURCE OF PARTICLE-BEAM EPITAXIAL DEVICE
摘要 PURPOSE:To improve the discharge efficiency and to obtain a desired degree of vacuum with a small-sized device by setting a collimator obliquely in a collimator chamber, and further setting a vacuum pump capable of sucking directly particles reflected on said inclined wall surface. CONSTITUTION:Raw gas whose flow rate is controlled is sent into a perticle beam generating chamber 6, and sent out from an ejection port 8 as a particle beam which is separated to a particle beam 16 necessary for crystal growth and an unnecessary beam 18 by a collimetor 42 in a collimator chamber 40. The particle beam 16 is struck against a substrate 32 provided in a growth chamber 30 of a main chamber 14, and crystals are grown. Meanwhile, unnecessary gas particles are discharged by a turbo-molecular pump 44. In said device, the collimater 42 is obliquely set, and the turbo-molecular pump 44 is equipped directly to the collimater chamber without interposing any pipe-lines, etc. in the direction of the movement of the unnecessary gas particles 18 which is reflected on the wall surface.
申请公布号 JPS60231496(A) 申请公布日期 1985.11.18
申请号 JP19840085935 申请日期 1984.04.26
申请人 SHIMAZU SEISAKUSHO KK 发明人 KATAYAMA YUKIAKI
分类号 C30B23/08;C30B25/02;H01L21/02 主分类号 C30B23/08
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