发明名称 HEAT TREATMENT OF DOPED QUARTZ POROUS GLASS BASE MATERIAL
摘要 PURPOSE:To obtain a doped glass base material satisfying low OH groups and high NA by heat-treating a porous glass base material in an atmosphere contg. a gas which volatilize a dopant and a gas which does not volatilize the dopant and wherein the volatilized dopant is not redeposited. CONSTITUTION:An atmosphere contg. an atmospheric gas of chlorine or a chlorine compd. and used for volatilizing a dopant and an atmospheric gas consisting of a chlorine compd. and not volatilizing the dopant is formed, and the volatilized dopant is not redeposited in said atmosphere. A quartz porous glass base material contg. a dopant is heat-treated in said atmosphere. The low OH, high NA, the clarification of the interface between both adjacent glasses, etc. can be satisfied by said method.
申请公布号 JPS60231433(A) 申请公布日期 1985.11.18
申请号 JP19840085575 申请日期 1984.04.27
申请人 FURUKAWA DENKI KOGYO KK 发明人 YOSHIDA KAZUAKI;OGURA KUNIO;IINO AKIRA;ORIMO KATSUMI
分类号 C03B8/04;C03B20/00;C03B37/014;G02B6/00 主分类号 C03B8/04
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