发明名称 VAPOR DEPOSITION DEVICE
摘要 PURPOSE:To form a uniform and thick film deposited by evaporation by ionizing and releasing the evaporating material from an evaporating source, providing a vessel-shaped shielding material having the electric charge of the same code as the code of the ionized particle groups in a vacuum vessel and dropping the particle groups onto a material for vapor deposition after rising upward said groups. CONSTITUTION:The shielding material 2 made into a vessel shape is provided into the vacuum vessel 1 and the evaporating material evaporated from the evaporating source provided in the lower part thereof is ionized by an ionizing device or ion cluster device 3 to form the ionized particle groups. The material 2 is impressed with the electric charge of the same code as the code of the ion- charged particle groups and therefore the particle groups ascend in the material 2 without sticking to the material 2 and falls upon arrival at the peak point. The falling particle groups are uniformly deposited by evaporation on a film- shaped material 4 for vapor deposition which travels below the material 2.
申请公布号 JPS60230977(A) 申请公布日期 1985.11.16
申请号 JP19840087911 申请日期 1984.05.02
申请人 DAIICHI SEIKOU KK 发明人 MATSUYAMA YOSHIHIKO
分类号 C23C14/32;C23C14/56 主分类号 C23C14/32
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