| 摘要 |
PURPOSE:To detect the shift of a charged particle beam from the reference axis by installing facing electrodes with a charged particle beam path placed between them and comparing the charged particles of the electrodes induced by the charged particle beam. CONSTITUTION:Pairs of parallel plate electrodes 11, 12 and 13, 14 are installed with a charged particle beam 15 of an ion implantation device, etc. placed between the electrodes 11 and 12 and between the electrodes 13 and 14; the former electrodes are installed perpendicular to the latter electrodes. Resistors 16x and 16y for connecting the outer surfaces are installed between the pairs of electrodes 11, 12 and 13, 14. The potential differences of these pairs are fed into instantaneous waveform storage devices 18x and 18y through amplifiers 17x and 17y. The electric charges of the electrodes induced by the beam 15 are compared according to currents flowing through resistors 16x and 16y, thereby detecting the axial shift of the beam 15. As a result, the axial shift and its direction of the beam 15 can be known without touching the beam 15, thereby facilitating the controlling. |
