| 摘要 |
PURPOSE:The titled polymer usable as a heat-resistant material, semiconductor material, resist material, etc., having stability to air, obtained by homopolymerizing an adamanthylacetylene or copolymerizing it with an acetylene derivative. CONSTITUTION:An admanthylacetylene shown by the formula I (A is H, alkyl, aryl, aralkyl, alkoxy, or halogen) such as 1-adamanthyl-acetylene, 1-(3-bromoadamanthyl)acetylene, etc. is homopolymerized or copolymerized with an acetylene derivative shown by the formula II (R<1> is H, or Cl; R<2> is 1-24C alkyl, aryl, or trialkylsilyl) such as t-butylacetylene, dimethylethylsilylacetylene, etc. in the presence of a catalyst such as tungesten hexachloride, molybdenum pentachloride, etc. at -30-+100 deg.C polymerization reaction temperature for 0.5-24hr, to give the desired polymer.
|
