| 摘要 |
PURPOSE:To mass-produce the desired thin film having favorable reproducibility by a method wherein extremely thin film thickness is detected easily and moreover with high sensitivity by detecting the change of intensity of secondary electrons. CONSTITUTION:A thin film forming device enabled to perform dual evaporation is equipped with an electron gun 1 and a fluorescent screen 4. A secondary electron detector 3 to detect film thickness of a thin film to be adhered to the surface of a substrate 2 by observing intensity of secondary electrons to be generated by projecting an electron beam to the substrate 2 is provided. Output of the detector 3 is inputted to the driving mechanisms of shutters 8, 9, and the shutters 8, 9 are operated repetitiously. Accordingly, the desired thin film is mass-produced with favorable reproducibility. |
