发明名称 VACUUM DEPOSITION METHOD
摘要 PURPOSE:To improve the corrosion and wear resistances of the metallic layer on a substrate when a protective film is formed on the metallic layer by the vacuum deposition of a surfactant, by introducing ionized steam into a part close to the substrate so as to stick firmly the surfactant to the metallic layer. CONSTITUTION:The metallic layer is formed on a polymer film of polyester or the like as a substrate 1, and water injected from a cylinder 4 is ionized with a high frequency coil 5 and introduced into a part close to the substrate 1. The surfactant 7 is then evaporated to form the protective film of the surfactant 7 on the surface of the metallic layer. At this time, since oxygen and hydroxyl ions are present, the surfactant 7 is easily converted into metallic salt and sticks firmly to the metallic layer.
申请公布号 JPS60228672(A) 申请公布日期 1985.11.13
申请号 JP19840084688 申请日期 1984.04.26
申请人 HITACHI CONDENSER KK 发明人 MATSUZAKI SOUICHI;OSADA MINORU
分类号 C23C14/24;C23C14/00 主分类号 C23C14/24
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