发明名称 EVAPORATION SOURCE CRUCIBLE FOR MOLECULAR BEAM EPITAXY
摘要 PURPOSE:To enable forming of a thin film which has extremely good reproducibility of distribution of film thickness due to a constant divergent angle of vapor by providing a lid with plural through holes covering an evaporated material inside an evaporation source crucible. CONSTITUTION:A lid 5 which has slits 6 is placed on a supporter 7 inside a crucible 1 and below the lid 5, a material 4 to be evaporated is placed. Vapor from the crucible passes through the lid 5 and the divergent angle theta3 does not depend upon the surface of the evaporated material 4 liquid so distribution of film thickness is only related to the lid, the shape of the crucible and the position of a substrate whereby the distribution of film thickness which has extremely good reproducibility can be obtained.
申请公布号 JPS60225421(A) 申请公布日期 1985.11.09
申请号 JP19840080203 申请日期 1984.04.23
申请人 TOSHIBA KK 发明人 MASHITA MASAO
分类号 H01L21/268;H01L21/203 主分类号 H01L21/268
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