发明名称 |
SEMICONDUCTOR LASER DEVICE |
摘要 |
The invention refers to a semiconductor laser device having a strip-shaped impurity-diffused region disposed in at least parts of semiconductor layers, consisting of a first semiconductor layer having an active region, a second semiconductor layer lying in contact with the first semiconductor layer and a surface semiconductor layer, whereby the impurity-diffused region having the same conductivity type as that of the second semi-conductor layer extends at least from the surface semi-conductor layer to a depth close to the first semiconductor layer, and whereby an electrode is disposed on the impurity-diffused region so that a forward current may flow from the electrode through the impurity-diffused region to the first semiconductor layer.
<??>The invention is characterized in that there is disposed between the surface semiconductor layer (6) and the second semiconductor layer (4) a third semiconductor layer (5) having a diffusion rate for the impurity forming the impurity-diffused region (7, 71) lower than within the second semiconductor layer (4). |
申请公布号 |
DE3172507(D1) |
申请公布日期 |
1985.11.07 |
申请号 |
DE19813172507 |
申请日期 |
1981.06.16 |
申请人 |
HITACHI, LTD. |
发明人 |
KURODA, TAKAO;UMEDA, JUN-ICHI;SAITO, KATSUTOSHI;KAJIMURA, TAKASHI |
分类号 |
H01S5/00;H01S5/20;H01S5/223;(IPC1-7):H01S3/19 |
主分类号 |
H01S5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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