发明名称 SEMICONDUCTOR LASER DEVICE
摘要 The invention refers to a semiconductor laser device having a strip-shaped impurity-diffused region disposed in at least parts of semiconductor layers, consisting of a first semiconductor layer having an active region, a second semiconductor layer lying in contact with the first semiconductor layer and a surface semiconductor layer, whereby the impurity-diffused region having the same conductivity type as that of the second semi-conductor layer extends at least from the surface semi-conductor layer to a depth close to the first semiconductor layer, and whereby an electrode is disposed on the impurity-diffused region so that a forward current may flow from the electrode through the impurity-diffused region to the first semiconductor layer. <??>The invention is characterized in that there is disposed between the surface semiconductor layer (6) and the second semiconductor layer (4) a third semiconductor layer (5) having a diffusion rate for the impurity forming the impurity-diffused region (7, 71) lower than within the second semiconductor layer (4).
申请公布号 DE3172507(D1) 申请公布日期 1985.11.07
申请号 DE19813172507 申请日期 1981.06.16
申请人 HITACHI, LTD. 发明人 KURODA, TAKAO;UMEDA, JUN-ICHI;SAITO, KATSUTOSHI;KAJIMURA, TAKASHI
分类号 H01S5/00;H01S5/20;H01S5/223;(IPC1-7):H01S3/19 主分类号 H01S5/00
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