发明名称 HIGH DENSITY SEMICONDUCTOR MEMORY DEVICE AND PROCESS FOR PRODUCING THE SAME
摘要 <p>A charge-pump-memory device is disclosed which comprises an insulating substrate (11) on which are arranged: an n<+> semiconductor region (12) which constitutes a bit line; another n<+> semiconductor region (14) which constitutes a power supply line; and a p-type semiconductor region (13) between the two n<+> semiconductor regions which is a floating base region; a metal wiring layer (16) constituting a word line is situated on an insulating layer (15) over the semiconductor regions, the floating base region being separated from the wiring layer by only a thin portion of the insulating layer. The bit line runs parallel with the power supply line and perpendicular to the metal wiring constituting the word line.</p>
申请公布号 EP0047133(B1) 申请公布日期 1985.11.06
申请号 EP19810303910 申请日期 1981.08.26
申请人 FUJITSU LIMITED 发明人 SASAKI, NOBUO
分类号 H01L29/78;H01L21/265;H01L21/768;H01L21/8242;H01L23/535;H01L27/10;H01L27/108;H01L29/786;(IPC1-7):H01L29/78;G11C11/34;H01L27/12;H01L21/86 主分类号 H01L29/78
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