| 摘要 |
PURPOSE:To form an insulating thin film without blackening a transparent electrode by depositing an insulating film in a state in which an electrically conductive transparent film acting as the electrode is insulated from ground potential. CONSTITUTION:The insulating film is deposited on a substrate 2 having the deposited electrically conductive transparent film 4 by a plasma CVD method. At this time, an insulating board 11 is put between the film 4 on the substrate 2 and a holder 5 so as to insulate the film 4 from ground potential. In this state the insulating film is formed by deposition. Since no electron is supplied from the holder 5, the blackening of the transparent electrode can be prevented. Accordingly, an EL panel or the like with less variance of luminance can be obtd. |
