| 摘要 |
PURPOSE:To provide a titled device which controls the quantity of the ion plunging into a substrate without increasing a substrate voltage by connecting a target provided to face the substrate electrode to a variable magnetic flux cathode and constituting the same in such a way that the magnetic flux on the target surface can be controlled. CONSTITUTION:The target 5 is provided to face the substrate electrode 2 attached with the substrate 4 on the front face in a vacuum chamber 1 evacuated to a vacuum. The cathode 3 provided with an electromagnet 3a is connected thereto and an earth shield 8 is provided threto. The electrode 2 and cathode 3 are respectively connected to power sources 6, 7 so as to attain the negative potential with the earth potential. The convergent density of plasma discharge is controlled by changing the magnetic flux density on the target 5 by said electromagnet 3a to plunge much of the ion to the substrate 4 in the stage of introducing an inert gas into the chamber 1, generating plasma discharge between the electrode 2 as an anode and the cathode 3 and performing sputtering by the formed ion. The bias effect is thus improved without damaging the substrate and sputtering with good flatness is executed. |
