| 摘要 |
PURPOSE:To eliminate adverse effect due to secondary electrons and reverse scattering electrons and to form a vapor-deposited film having excellent state on the material to be worked by separating electrically the material to be worked from earth in a vapor-depositing apparatus heating and evaporating the vapor- depositing substance with accelerating electron beam. CONSTITUTION:In case of forming a vapor-depositing film on a wafer 3 as the material to be worked by heating and evaporating vapor-depositing substances with accelerating electron beam, a wafer holder 4 is attached to a supporting rod 2 of a holder bearer 1. In this case, the wafer holder 4 is electrically insulated from earth by passing an insulating bearer 5 made of borosilicate glass through the holder supporting rod 2 and previously electrified to negative electric potential with flying electrons. The secondary electrons from an evaporation source and the reverse scattering electrons are repulsed by means of the negative electric potential and the generation of adverse effect such as the breakage of pattern of vapor-deposited film on the wafer due to those electrons can be prevented. |
