发明名称 Aperture structure for charged beam exposure
摘要 In an aperture for a charged particle beam exposure apparatus, the outside edges of fine wires are located inside the individual sides of an opening formed in a conductive sheet so that an opening smaller than the opening of the conductive sheet is defined by the fine wires.
申请公布号 US4550258(A) 申请公布日期 1985.10.29
申请号 US19830515304 申请日期 1983.07.19
申请人 NIPPON TELEGRAPH & TELEPHONE PUBLIC CORPORATION 发明人 OMATA, FUJIO;TAKAMOTO, KIICHI
分类号 H01J37/09;(IPC1-7):H01J37/00 主分类号 H01J37/09
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