发明名称 |
Aperture structure for charged beam exposure |
摘要 |
In an aperture for a charged particle beam exposure apparatus, the outside edges of fine wires are located inside the individual sides of an opening formed in a conductive sheet so that an opening smaller than the opening of the conductive sheet is defined by the fine wires.
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申请公布号 |
US4550258(A) |
申请公布日期 |
1985.10.29 |
申请号 |
US19830515304 |
申请日期 |
1983.07.19 |
申请人 |
NIPPON TELEGRAPH & TELEPHONE PUBLIC CORPORATION |
发明人 |
OMATA, FUJIO;TAKAMOTO, KIICHI |
分类号 |
H01J37/09;(IPC1-7):H01J37/00 |
主分类号 |
H01J37/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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