| 摘要 |
PURPOSE:To obtain stably a garnet film of the same composition as a bulk material, by treating a magnetic garnet material expressed by a specific formula by the high-frequency sputtering method to form a film on a substrate, and treating the resultant film at a high temperature under specific conditions. CONSTITUTION:A high-frequency electric power at 7-110W/cm<2> is applied to a magnetic garnet material, expressed by the compsn. formula {Gd2Y3-2x-zCa2x} (Fe2-yIny)(Fe3-xVx)O12, and satisfying 0<=x<=0.6, 0<=y<=0.6 and 0.6<=z<=2.6 as a target by the high-frequency sputtering method to form a film on a substrate. The resultant film is then treated at a temperature as high as 300-1,450 deg.C in the air or oxygen atmosphere. |
