| 摘要 |
PURPOSE:To detect an exact advance state of an application of a photoresist for etching or its development by monitoring continuously a specified part of a rotating body by following its rotation. CONSTITUTION:A beam light 4b emitted from a light emitting device 4 is reflaction mirror 6 and projected to one end face of one of many optical fibers 11f arranged on the periphery in one end face of an optical fiber cable 11. The reflection mirror 6 is rotated by a pulse motor 6M centering around an axis coinciding with a path where the beam light 4b is reflected by the reflection mirror 6, therefore, the beam light 4b reflected by the reflection mirror 6 is projected successively to each one end face of each optical fiber 11f arranged on the peripher following a rotation of the reflection mirror 6. The beam light 4b projected to one end face of the optical fiber 11f is transmitted to its other end face, namely, the other end of the optical fiber cord 11 and projected, and reaches the surface of a material to be developed 1 through an objective lens 7. Subsequently, its reflected light is photodetected by an analyzing device 8 and a prescribed analysis is executed.
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