发明名称 METHOD FOR FORMATION OF PATTERN
摘要 PURPOSE:To enable to control the two dimensional arrangement of a monomolecular film or a monomolecular accumulated film by a method wherein a ray of light is scanned on the surface of a base in the state wherein no atmospheric gas is present, and after the monomolecular film or the monomolecular accumulated film has been formed, supersonic vibrations are applied thereon. CONSTITUTION:A monomolecular accumulated film 1-2 of arachidic acid is formed on the surface of an Si (100) substrate 1-1 and the like by performing an LB method, and a base is formed. Then, argon laser beams are condensed and scanned on the surface of the base. The arachidic acid film on a scanned part 1-4 is modified and evaporated, and a pattern is formed. Subsequently, a monomolecular accumulated film consisting of arachidic acid and a melocyanine derivative is formed by performing an LB method. Then, when supersonic vibrations are applied in water, the monomolecular accumulated film on the modified part 1-4 is exfoliated, the monomolecular accumulated film is left and formed on the non-modified part 1-3 only in accordance with a pattern.
申请公布号 JPS60211933(A) 申请公布日期 1985.10.24
申请号 JP19840067590 申请日期 1984.04.06
申请人 CANON KK 发明人 HIRAI YUTAKA;TOMITA YOSHINORI;MATSUDA HIROSHI
分类号 H01L51/05;H01L21/304;H01L21/312;H01L21/368;H01L49/02;H01L51/40 主分类号 H01L51/05
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