发明名称 FORMING METHOD OF PATTERN
摘要 PURPOSE:To enable the control of two-dimentional arrangement of a monomolecular film or a monomolecular accumulated film, by scanning the surface of a substrate by means of electron beams without the presence of an ambient gas, and by forming thereafter a pattarn according to which the monomolecular film or the monomolecular accumulated film is formed. CONSTITUTION:An Si (100) plate 1-1 being used as a substrate, for instance, oxygen is made to flow along the surface part of the substrate, and the surface of the substrate is scanned by electron beams so as to be oxidized by about 100Angstrom , whereby a stripe pattern is formed. Next, a monomolecular accumulated film of arachidic acid is formed by the LB method. More concretely, first the substrate is dipped in water, and the monomolecular film of arachidic acid is developed and then deposited. When ultrasonic vibrations are applied thereto subsequently, the monomolecular accumulated film of arachidic acid in a part 1-3 is exfoliated, and thus the film is formed only in a part 1-2 in accordance with the pattern.
申请公布号 JPS60211917(A) 申请公布日期 1985.10.24
申请号 JP19840067574 申请日期 1984.04.06
申请人 CANON KK 发明人 HIRAI YUTAKA;MATSUDA HIROSHI;TOMITA YOSHINORI
分类号 H01L51/05;H01L21/304;H01L21/312;H01L21/368;H01L49/02;H01L51/40 主分类号 H01L51/05
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