发明名称 PHOTO-RESIST COATING APPARATUS
摘要 PURPOSE:To reduce the irregularity in the thickness of a resist film, by providing a resist receiving part arranged opposedly to a resist supply nozzle and recirculating a liquid at the time of non-dripping in such a state that both of them are closely contacted. CONSTITUTION:Resist is dripped from a nozzle 1 but a resist receiving part 8 is mounted to a supply nozzle 1 after dripping by a rotary drive system 9 and an up-and-down drive system 10 to form a resist flowline. Whereupon, a pump 3 is operated and the resist is always recirculated to keep the concn. thereof constant.
申请公布号 JPS60212269(A) 申请公布日期 1985.10.24
申请号 JP19840068489 申请日期 1984.04.06
申请人 NIPPON DENKI KK 发明人 TSUTSUI HIROAKI
分类号 B05C11/08;H01L21/027;H01L21/30 主分类号 B05C11/08
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