发明名称 METHOD FOR FORMATION OF PATTERN
摘要 PURPOSE:To enable to control the two dimensional arrangement of a monomolecular film or a monomolecular accumulated film by a method wherein X- rays are scanned on the surface of a base in a reducing gas atmosphere, and after the pattern of a monomolecular film or a monomolecular accumulated film has been formed, supersonic vibrations are applied thereon. CONSTITUTION:A glass substrate 1-1 whereon an ITO1-2 and the like is deposited is used as a base. The base is placed in vacuum, hydrogen is flowed into the surface part of the base, X-rays are scanned on the surface of the base using a mask, and the base having a modified part 1-3 of 300Angstrom in depth is formed. Then, using a chloroform solution of arachidic acid, a monomolecular accumulated film of arachidic acid is formed. Subsequently, when supersonic waves are applied in water, the monomolecular accumulated film of the modified part 1-3 is exfoliated, and a monomolecular accumulated film 1-5 is formed on the non- modified part 1-4 only in accordance with a pattern.
申请公布号 JPS60211931(A) 申请公布日期 1985.10.24
申请号 JP19840067588 申请日期 1984.04.06
申请人 CANON KK 发明人 HIRAI YUTAKA;TOMITA YOSHINORI;MATSUDA HIROSHI
分类号 H01L51/05;H01L21/304;H01L21/312;H01L21/368;H01L31/18;H01L49/02;H01L51/40 主分类号 H01L51/05
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