发明名称 METHOD FOR FORMATION OF PATTERN
摘要 PURPOSE:To enable to control the two dimensional arrangement of a monomolecular film or a monomolecular accumulated film by a method wherein X- rays are scanned on the surface of a base in an oxidizing gas atmosphere, and after the monomolecular film or a monomolecular accumulated film has been formed, supersonic waves are applied thereon. CONSTITUTION:An aluminum film 1-2 is vapor-deposited on a glass substrate 1-1 and the like by performing a vacuum-evaporating method, and a base is formed. Then, the substrate is placed in an oxygen atmosphere, argon laser beams are condensed and scanned on the surface of the base. Subsequently, the monomolecular accumulated film of arachidic acid is formed by performing an LB method using a chloroform solution of arachidic acid. Then, when supersonic vibrations are applied, the monomolecular accumulated film 1-5 is left on the base 1-3 only of the part which is modified by the scanning of argon laser beams, the monomolecular accumulated film on the non-modified part 1-4 is exfoliated, and the monomolecular accumulated film is formed in accordance with a pattern.
申请公布号 JPS60211932(A) 申请公布日期 1985.10.24
申请号 JP19840067589 申请日期 1984.04.06
申请人 CANON KK 发明人 HIRAI YUTAKA;TOMITA YOSHINORI;MATSUDA HIROSHI
分类号 H01L51/05;H01L21/304;H01L21/312;H01L21/368;H01L49/02;H01L51/40 主分类号 H01L51/05
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