发明名称 GASIFICATION APPARATUS OF VOLATILE SUBSTANCE
摘要 PURPOSE:To perform stably the supply of volatile matter and a carrier gas to a CVD reaction chamber by providing pressure gauges, pressure control valves and check valves respectively to an inlet of the carrier gas and an outlet of the carrier gas and the volatile matter in a gasification vessel of a volatile substance used in the CVD apparatus or the like. CONSTITUTION:A carrier gas is supplied to a gasification vessel incorporated with volatile substance 3 from an inflow port 1 and supplied to a CVD reaction chamber from an outflow port 5 together with the vapor of the volatile substance gasified in the gasification vessel. Pressure gauges 6, 7, pressure control valves 8, 9 and check valves 10, 11 are respectively fitted to a gas inflow port 1 and an outflow port 5. Since the pressure of gas in the gasification vessel can be suitably controlled with both the valves 8, 9, it can be maintained at constant without being affected by the outer pressure. As a result, the amount of the volatile matter to be gasified is decided with only the temp. and the amount of vapor of the volatile matter to be supplied and the carrier gas can be precisely controlled by maintaining the temp. at constant and also the vapor of volatile matter is prevented with the check valves 10, 11 from being flowed out to the outer part from the gas inflow port 1.
申请公布号 JPS60211072(A) 申请公布日期 1985.10.23
申请号 JP19840069303 申请日期 1984.04.06
申请人 MATSUSHITA DENKI SANGYO KK 发明人 BAN YUUZABUROU;MORIZAKI MOTOJI;OGURA MOTOTSUGU;HASE NOBUYASU
分类号 F17C9/02;C23C16/44;C23C16/448;C30B25/14 主分类号 F17C9/02
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