| 摘要 |
PURPOSE:To completely remove the portion of unexposure under the condition of less Al corrosion by a method wherein a solution containing required amouts of hydrated hydrazine, ketone, and water or alcohol and an unexposed positive type photo resist are brought into the contact. CONSTITUTION:The unexposed positive type photo resist applied to a substrate after post-baking treatment at 130 deg.C or more is put in contact with the solution containing 80-95wt% of hydrated hydrazine, 5-20wt% of methylethylketone, and 0-15wt% of well-known alcohol or water, then being treated at 20-30 deg.C. With this construction, the unexposed positive type photo resist can be removed easily and completely in a short time, and the corrosion of the evaporated Al is markedly inhibited. Besides, the additional use of supersonic washing can markedly reduce the time for removal treatment. |
