摘要 |
PURPOSE:To obtain a long-life electrochromic display element which is stable against an adhesive by decomposing organosilanol thermally and forming an SiO2 film as a protection film for the transparent conductive film of a transparent conductive substrate. CONSTITUTION:The transparent conductive film 1b of ITO formed on the transparent conductive substrate 1 to a 2,100Angstrom thickness is coated with OCD B-80315 [consisting of a 8.0% density Si. film and 0.15g impurities (boron)] and a baking treatment is carried out at 500 deg.C for 30min to form the SiO2 film 3 containing boron to an about 2,500Angstrom film thickness. A resist pattern is formed by photolithography and then the SiO2 film 3 on the substrate 1 where WO3 is expected to be vapor-deposited is etched to remove the SiO2 film 3 at the place. Then, WO3 is vapor-deposited to form a WO3 vapor-deposited layer 2 and then the electrochromic display element is assembled by an ordinary method. |